Waterproof molecular monolayers stabilize 2D materials

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DOI

  • Cong Su, Massachusetts Institute of Technology
  • ,
  • Zongyou Yin, Australian National University
  • ,
  • Qing Bo Yan, Massachusetts Institute of Technology, University of Chinese Academy of Sciences
  • ,
  • Zegao Wang, College of Materials Science and Engineering, Sichuan University
  • ,
  • Hongtao Lin, Massachusetts Institute of Technology, Zhejiang University
  • ,
  • Lei Sun, Massachusetts Institute of Technology
  • ,
  • Wenshuo Xu, Oxford University, Oxford, UK.
  • ,
  • Tetsuya Yamada, Shinshu University
  • ,
  • Xiang Ji, Massachusetts Institute of Technology
  • ,
  • Nobuyuki Zettsu, Shinshu University
  • ,
  • Katsuya Teshima, Shinshu University
  • ,
  • Jamie H. Warner, Oxford University, Oxford, UK.
  • ,
  • Mircea Dincă, Massachusetts Institute of Technology
  • ,
  • Juejun Hu, Massachusetts Institute of Technology
  • ,
  • Mingdong Dong
  • Gang Su, University of Chinese Academy of Sciences
  • ,
  • Jing Kong, Massachusetts Institute of Technology
  • ,
  • Ju Li, Massachusetts Institute of Technology

Two-dimensional van der Waals materials have rich and unique functional properties, but many are susceptible to corrosion under ambient conditions. Here we show that linear alkylamines n-C m H2m+1NH2, with m = 4 through 11, are highly effective in protecting the optoelectronic properties of these materials, such as black phosphorus (BP) and transition-metal dichalcogenides (TMDs: WS2, 1T'-MoTe2, WTe2, WSe2, TaS2, and NbSe2). As a representative example, n-hexylamine (m = 6) can be applied in the form of thin molecular monolayers on BP flakes with less than 2-nm thickness and can prolong BP's lifetime from a few hours to several weeks and even months in ambient environments. Characterizations combined with our theoretical analysis show that the thin monolayers selectively sift out water molecules, forming a drying layer to achieve the passivation of the protected 2D materials. The monolayer coating is also stable in air, H2 annealing, and organic solvents, but can be removed by certain organic acids.

Original languageEnglish
JournalProceedings of the National Academy of Sciences of the United States of America
Volume116
Issue42
Pages (from-to)20844-20849
Number of pages6
ISSN0027-8424
DOIs
Publication statusPublished - 2019

    Research areas

  • anticorrosion, molecular monolayer stabilizer, multilayer 2D materials

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