Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

Xavier Baami González; Jimmy Duc Tran; Duncan S. Sutherland

doi:10.1021/acsami.4c07100

Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

Xavier Baami González, Jimmy Duc Tran, Duncan S. Sutherland^*

^*Corresponding author for this work

Interdisciplinary Nanoscience Center - INANO-Fysik, iNANO-huset

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaper › Journal article › Research › peer-review

1 Citation (Scopus)

Abstract

Nanomaterials shaped as rings are interesting nanostructures with control of the materials properties at the nanoscale. Nanoring plasmonic resonators provide tunable optical resonances in the near-infrared with application in sensing. Fabrication of nanorings can be carried out via top-down approaches based on electron beam lithography with high control of the ring size parameters but at high cost. Alternatively, fabrication via self-assembly approaches has a higher speed/lower cost but at the cost of control of ring parameters. Current colloidal lithography approaches can provide nanoring fabrication over large areas but only of specific materials and a select set of rings (large ring diameters or small rings with ultrathin walls). We extend Hole-mask Colloidal Lithography to use ring shaped holes, allow the deposition of arbitrary materials, and allow the independent tuning of ring-wall thickness over a large range of values. We present a generic approach for the fabrication of nanorings formed from a range of materials including low cost (e.g., Cu, Al) and nonplasmonic (e.g., W) materials and with control of ring wall thickness and diameter allowing tuning of ring parameters and materials for applications in nanooptics and beyond.

Original language	English
Journal	ACS Applied Materials and Interfaces
Volume	16
Issue	27
Pages (from-to)	35361-35371
Number of pages	11
ISSN	1944-8244
DOIs	https://doi.org/10.1021/acsami.4c07100
Publication status	Published - Jul 2024

Keywords

colloidal lithography
nanofabrication
nanorings
plasmonic structures
self-assembly

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10.1021/acsami.4c07100

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@article{d02ff141fb934df5b57e7bc48e1173b3,

title = "Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography",

abstract = "Nanomaterials shaped as rings are interesting nanostructures with control of the materials properties at the nanoscale. Nanoring plasmonic resonators provide tunable optical resonances in the near-infrared with application in sensing. Fabrication of nanorings can be carried out via top-down approaches based on electron beam lithography with high control of the ring size parameters but at high cost. Alternatively, fabrication via self-assembly approaches has a higher speed/lower cost but at the cost of control of ring parameters. Current colloidal lithography approaches can provide nanoring fabrication over large areas but only of specific materials and a select set of rings (large ring diameters or small rings with ultrathin walls). We extend Hole-mask Colloidal Lithography to use ring shaped holes, allow the deposition of arbitrary materials, and allow the independent tuning of ring-wall thickness over a large range of values. We present a generic approach for the fabrication of nanorings formed from a range of materials including low cost (e.g., Cu, Al) and nonplasmonic (e.g., W) materials and with control of ring wall thickness and diameter allowing tuning of ring parameters and materials for applications in nanooptics and beyond.",

keywords = "colloidal lithography, nanofabrication, nanorings, plasmonic structures, self-assembly",

author = "{Baami Gonz{\'a}lez}, Xavier and Tran, {Jimmy Duc} and Sutherland, {Duncan S.}",

note = "Publisher Copyright: {\textcopyright} 2024 The Authors. Published by American Chemical Society.",

year = "2024",

month = jul,

doi = "10.1021/acsami.4c07100",

language = "English",

volume = "16",

pages = "35361--35371",

journal = "ACS Applied Materials and Interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

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Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography. / Baami González, Xavier; Tran, Jimmy Duc; Sutherland, Duncan S.
In: ACS Applied Materials and Interfaces, Vol. 16, No. 27, 07.2024, p. 35361-35371.

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaper › Journal article › Research › peer-review

TY - JOUR

T1 - Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

AU - Baami González, Xavier

AU - Tran, Jimmy Duc

AU - Sutherland, Duncan S.

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Y1 - 2024/7

N2 - Nanomaterials shaped as rings are interesting nanostructures with control of the materials properties at the nanoscale. Nanoring plasmonic resonators provide tunable optical resonances in the near-infrared with application in sensing. Fabrication of nanorings can be carried out via top-down approaches based on electron beam lithography with high control of the ring size parameters but at high cost. Alternatively, fabrication via self-assembly approaches has a higher speed/lower cost but at the cost of control of ring parameters. Current colloidal lithography approaches can provide nanoring fabrication over large areas but only of specific materials and a select set of rings (large ring diameters or small rings with ultrathin walls). We extend Hole-mask Colloidal Lithography to use ring shaped holes, allow the deposition of arbitrary materials, and allow the independent tuning of ring-wall thickness over a large range of values. We present a generic approach for the fabrication of nanorings formed from a range of materials including low cost (e.g., Cu, Al) and nonplasmonic (e.g., W) materials and with control of ring wall thickness and diameter allowing tuning of ring parameters and materials for applications in nanooptics and beyond.

AB - Nanomaterials shaped as rings are interesting nanostructures with control of the materials properties at the nanoscale. Nanoring plasmonic resonators provide tunable optical resonances in the near-infrared with application in sensing. Fabrication of nanorings can be carried out via top-down approaches based on electron beam lithography with high control of the ring size parameters but at high cost. Alternatively, fabrication via self-assembly approaches has a higher speed/lower cost but at the cost of control of ring parameters. Current colloidal lithography approaches can provide nanoring fabrication over large areas but only of specific materials and a select set of rings (large ring diameters or small rings with ultrathin walls). We extend Hole-mask Colloidal Lithography to use ring shaped holes, allow the deposition of arbitrary materials, and allow the independent tuning of ring-wall thickness over a large range of values. We present a generic approach for the fabrication of nanorings formed from a range of materials including low cost (e.g., Cu, Al) and nonplasmonic (e.g., W) materials and with control of ring wall thickness and diameter allowing tuning of ring parameters and materials for applications in nanooptics and beyond.

KW - colloidal lithography

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KW - plasmonic structures

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ER -

Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

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