Standard
Thermal migration of alloying agents in aluminium. / Cooil, S. P.; Mortsell, E. A.; Mazzola, F.; Jorge, M.; Wenner, S.; Edmonds, M. T.; Thomsen, L.; Klemm, H. W.; Peschel, G.; Fuhrich, A.; Prieto, M.; Schmidt, Th; Miwa, J. A.; Holmestad, R.; Wells, J. W.
In:
Materials Research Express, Vol. 3, No. 11, 116501, 11.2016.
Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaper › Journal article › Research › peer-review
Harvard
Cooil, SP, Mortsell, EA, Mazzola, F, Jorge, M, Wenner, S, Edmonds, MT, Thomsen, L, Klemm, HW, Peschel, G, Fuhrich, A, Prieto, M, Schmidt, T
, Miwa, JA, Holmestad, R & Wells, JW 2016, '
Thermal migration of alloying agents in aluminium',
Materials Research Express, vol. 3, no. 11, 116501.
https://doi.org/10.1088/2053-1591/3/11/116501
APA
Cooil, S. P., Mortsell, E. A., Mazzola, F., Jorge, M., Wenner, S., Edmonds, M. T., Thomsen, L., Klemm, H. W., Peschel, G., Fuhrich, A., Prieto, M., Schmidt, T.
, Miwa, J. A., Holmestad, R., & Wells, J. W. (2016).
Thermal migration of alloying agents in aluminium.
Materials Research Express,
3(11), [116501].
https://doi.org/10.1088/2053-1591/3/11/116501
CBE
Cooil SP, Mortsell EA, Mazzola F, Jorge M, Wenner S, Edmonds MT, Thomsen L, Klemm HW, Peschel G, Fuhrich A, Prieto M, Schmidt T
, Miwa JA, Holmestad R, Wells JW. 2016.
Thermal migration of alloying agents in aluminium.
Materials Research Express. 3(11):Article 116501.
https://doi.org/10.1088/2053-1591/3/11/116501
MLA
Vancouver
Author
Cooil, S. P. ; Mortsell, E. A. ; Mazzola, F. ; Jorge, M. ; Wenner, S. ; Edmonds, M. T. ; Thomsen, L. ; Klemm, H. W. ; Peschel, G. ; Fuhrich, A. ; Prieto, M. ; Schmidt, Th
; Miwa, J. A. ; Holmestad, R. ; Wells, J. W. /
Thermal migration of alloying agents in aluminium. In:
Materials Research Express. 2016 ; Vol. 3, No. 11.
Bibtex
@article{ed42c9b58df348e7875d27311609b25c,
title = "Thermal migration of alloying agents in aluminium",
abstract = "The in situ thermal migration of alloying agents in an Al-Mg-Si-Li alloy is studied using surface sensitive photo-electron and electron diffraction/imaging techniques. Starting with the preparation of an almost oxide free surface (oxide thickness = 0.1 nm), the relative abundance of alloying agents (Mg, Li and Si) at the surface are recorded at various stages of thermal annealing, from room temperature to melting (which is observed at 550 degrees C). Prior to annealing, the surface abundances are below the detection limit",
keywords = "aluminium, alloy, surface migration, photoemission spectroscopy, thermal treatment, MG-SI ALLOYS, MICROSTRUCTURE, SPECTROSCOPY, GRAPHENE, HARDNESS",
author = "Cooil, {S. P.} and Mortsell, {E. A.} and F. Mazzola and M. Jorge and S. Wenner and Edmonds, {M. T.} and L. Thomsen and Klemm, {H. W.} and G. Peschel and A. Fuhrich and M. Prieto and Th Schmidt and Miwa, {J. A.} and R. Holmestad and Wells, {J. W.}",
year = "2016",
month = nov,
doi = "10.1088/2053-1591/3/11/116501",
language = "English",
volume = "3",
journal = "Materials Research Express",
issn = "2053-1591",
publisher = "IOP Publishing Ltd.",
number = "11",
}
RIS
TY - JOUR
T1 - Thermal migration of alloying agents in aluminium
AU - Cooil, S. P.
AU - Mortsell, E. A.
AU - Mazzola, F.
AU - Jorge, M.
AU - Wenner, S.
AU - Edmonds, M. T.
AU - Thomsen, L.
AU - Klemm, H. W.
AU - Peschel, G.
AU - Fuhrich, A.
AU - Prieto, M.
AU - Schmidt, Th
AU - Miwa, J. A.
AU - Holmestad, R.
AU - Wells, J. W.
PY - 2016/11
Y1 - 2016/11
N2 - The in situ thermal migration of alloying agents in an Al-Mg-Si-Li alloy is studied using surface sensitive photo-electron and electron diffraction/imaging techniques. Starting with the preparation of an almost oxide free surface (oxide thickness = 0.1 nm), the relative abundance of alloying agents (Mg, Li and Si) at the surface are recorded at various stages of thermal annealing, from room temperature to melting (which is observed at 550 degrees C). Prior to annealing, the surface abundances are below the detection limit
AB - The in situ thermal migration of alloying agents in an Al-Mg-Si-Li alloy is studied using surface sensitive photo-electron and electron diffraction/imaging techniques. Starting with the preparation of an almost oxide free surface (oxide thickness = 0.1 nm), the relative abundance of alloying agents (Mg, Li and Si) at the surface are recorded at various stages of thermal annealing, from room temperature to melting (which is observed at 550 degrees C). Prior to annealing, the surface abundances are below the detection limit
KW - aluminium
KW - alloy
KW - surface migration
KW - photoemission spectroscopy
KW - thermal treatment
KW - MG-SI ALLOYS
KW - MICROSTRUCTURE
KW - SPECTROSCOPY
KW - GRAPHENE
KW - HARDNESS
U2 - 10.1088/2053-1591/3/11/116501
DO - 10.1088/2053-1591/3/11/116501
M3 - Journal article
VL - 3
JO - Materials Research Express
JF - Materials Research Express
SN - 2053-1591
IS - 11
M1 - 116501
ER -