Profilometry and stress analysis of suspended nanostructured thin films

Ali Akbar Darki, Alexios Parthenopoulos, Jens Vinge Nygaard, Aurelien Romain Dantan*

*Corresponding author for this work

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaperJournal articleResearchpeer-review

Abstract

The profile of suspended silicon nitride thin films patterned with one-dimensional subwavelength grating structures is investigated using atomic force microscopy. We first show that the results of the profilometry can be used as input to rigorous coupled wave analysis simulations to predict the transmission spectrum of the gratings under illumination by monochromatic light at normal incidence and compare the results of the simulations with experiments. Second, we observe sharp vertical deflections of the films at the boundaries of the patterned area due to local modifications of the tensile stress during the patterning process. These deflections are experimentally investigated for various grating structures and discussed on the basis of a simple analytical model and finite element method simulations.

Original languageEnglish
Article number065302
JournalJournal of Applied Physics
Volume129
Issue6
ISSN0021-8979
DOIs
Publication statusPublished - Feb 2021

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