TY - JOUR
T1 - Growth and carrier transport performance of single-crystalline monolayer graphene over electrodeposited copper film on quartz glass
AU - Zhang, Chitengfei
AU - Tu, Rong
AU - Liu, Liu
AU - Li, Jun
AU - Dong, Mingdong
AU - Wang, Zegao
AU - Shi, Ji
AU - Li, Haiwen
AU - Ohmori, Hitoshi
AU - Zhang, Song
AU - Zhang, Lianmeng
AU - Goto, Takashi
PY - 2019
Y1 - 2019
N2 - The synthesis of single crystal graphene domains on cold rolling Cu foil has recently been reported. However, the cold rolling Cu foils have many rolling lines that increase the roughness of the foil. In this work, we developed an electrodeposited method to achieve high-quality Cu film on which the nucleation density of graphene decreased greatly. The Cu film was electrodeposited over chemical plated silver film on quartz glass. The roughness and thickness of the Cu film were positively correlated with the deposition temperature and current density, respectively. High-quality single crystal graphene with low nucleation density was achieved on electrodeposited Cu film. With increasing deposition temperature of Cu film from 20 to 65 °C, the nucleation density of graphene increased from 124 to 448 mm−2. The nucleation density of graphene increased from 124 to 192 mm−2 with increasing current density from 0.03 to 0.07 A/cm−2. Finally, a back-gated graphene field effect transistor (FET) was fabricated with a carrier transport performance of μh = ~4041 cm2V−1s−1 and μe = ~2580 cm2V−1s−1 at room temperature.
AB - The synthesis of single crystal graphene domains on cold rolling Cu foil has recently been reported. However, the cold rolling Cu foils have many rolling lines that increase the roughness of the foil. In this work, we developed an electrodeposited method to achieve high-quality Cu film on which the nucleation density of graphene decreased greatly. The Cu film was electrodeposited over chemical plated silver film on quartz glass. The roughness and thickness of the Cu film were positively correlated with the deposition temperature and current density, respectively. High-quality single crystal graphene with low nucleation density was achieved on electrodeposited Cu film. With increasing deposition temperature of Cu film from 20 to 65 °C, the nucleation density of graphene increased from 124 to 448 mm−2. The nucleation density of graphene increased from 124 to 192 mm−2 with increasing current density from 0.03 to 0.07 A/cm−2. Finally, a back-gated graphene field effect transistor (FET) was fabricated with a carrier transport performance of μh = ~4041 cm2V−1s−1 and μe = ~2580 cm2V−1s−1 at room temperature.
KW - Carrier transport performance
KW - Electrodeposited copper film
KW - Field effect transistor
KW - Single-crystalline monolayer graphene
UR - http://www.scopus.com/inward/record.url?scp=85070691935&partnerID=8YFLogxK
U2 - 10.1016/j.ceramint.2019.08.137
DO - 10.1016/j.ceramint.2019.08.137
M3 - Journal article
AN - SCOPUS:85070691935
SN - 0272-8842
VL - 45
SP - 24254
EP - 24259
JO - Ceramics International
JF - Ceramics International
IS - 18, Part A
ER -