Experimental and theoretical studies on self-diffusion in amorphous germanium

Tim Böckendorf*, Jan Kirschbaum, Felix Kipke, Dominique Bougeard, John Lundsgaard Hansen, Arne Nylandsted Larsen, Matthias Posselt, Hartmut Bracht

*Corresponding author for this work

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaperJournal articleResearchpeer-review

1 Citation (Scopus)

Abstract

Self-diffusion in amorphous germanium is studied at temperatures between 325 and 370 °C utilizing amorphous isotopically controlled germanium multilayer structures. The isotope multilayer is epitaxially grown on a single crystalline germanium-on-insulator structure by means of molecular beam epitaxy and subsequently amorphized by self-ion implantation. After heat treatment, the diffusional broadening of the isotope structure is measured with time-of-flight secondary ion mass spectrometry. The temperature dependence of self-diffusion is accurately described by the Arrhenius equation with the activation enthalpy Q = (2.21 ± 0.12) eV and pre-exponential factor D 0 = ( 2.3 2 − 2.10 + 20.79 ) cm2 s−1. The activation enthalpy equals the activation enthalpy of solid phase epitaxial recrystallization (SPER). This agreement suggests that self-diffusion in amorphous germanium is similar to SPER, also mainly mediated by local bond rearrangements. Classical molecular dynamics simulations with a modified Stillinger-Weber-type interatomic potential yield results that are consistent with the experimental data and support the proposed atomic mechanism.

Original languageEnglish
Article number065129
JournalAIP Advances
Volume14
Issue6
DOIs
Publication statusPublished - Jun 2024

Fingerprint

Dive into the research topics of 'Experimental and theoretical studies on self-diffusion in amorphous germanium'. Together they form a unique fingerprint.

Cite this