Enhanced photocatalytic properties of defect-rich α-MoO3 nanoflakes by cavitation and pitting effect

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  • Binjie Zheng, University of Electronic Science and Technology of China
  • ,
  • Zegao Wang, Sichuan University
  • ,
  • Xinqiang Wang, University of Electronic Science and Technology of China
  • ,
  • Yuanfu Chen, University of Electronic Science and Technology of China

For the first time, we present a novel, facile and eco-friendly engineering defect method, to produce defect-rich α-MoO3 (dr-MoO3) nanoflakes with abundant exposed reactive edge sites, by applying cavitation and pitting effect of high-power ultrasonic tip to inch-size α-MoO3 single crystals. The as-prepared dr-MoO3 nanoflakes deliver excellent photocatalytic activity for degradation of Rhodamine B (RhB) under visible light irradiation. The degradation apparent rate constant k of dr-MoO3 is as large as 5.9 × 10−2 min−1, which is ˜6.6 times higher than commercial α-MoO3 (com-MoO3). The superior photocatalytic performance of dr-MoO3 is attributed to its rich exposed edges and slight expansion of interlayer space, which not only enhance the adsorption of H2O and OH, provide abundant highly reactive sites, but also shorten the distance of photogenerated carriers moving to the reactive sites. This work provides new insights into the self-enhancement of α-MoO3 photocatalytic activities, which could be extended to other layered semiconductor photocatalysts.

Original languageEnglish
Article number120753
JournalJournal of Hazardous Materials
Volume378
Number of pages8
ISSN0304-3894
DOIs
Publication statusPublished - 15 Oct 2019

    Research areas

  • Defect-rich, Degradation, Photocatalytic, Tip ultrasonication, α-MoO

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