CVD growth of large-area and high-quality HfS2 nanoforest on diverse substrates

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaperJournal articleResearchpeer-review

  • Binjie Zheng, University of Electronic Science and Technology of China
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  • Zegao Wang
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  • Fei Qi, University of Electronic Science and Technology of China
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  • Xinqiang Wang, University of Electronic Science and Technology of China
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  • Bo Yu, University of Electronic Science and Technology of China
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  • Wanli Zhang, University of Electronic Science and Technology of China
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  • Yuanfu Chen, University of Electronic Science and Technology of China

Two-dimensional layered transition metal dichalcogenides (TMDs) have attracted burgeoning attention due to their various properties and wide potential applications. As a new TMD, hafnium disulfide (HfS2) is theoretically predicted to have better electrical performance than widely studied MoS2. The experimental researches also confirmed the extraordinary feature in electronics and optoelectronics. However, the maximal device performance may not be achieved due to its own limitation of planar structure and challenge of transfer without contamination. Here, through the chemical vapor deposition (CVD) technique, inch-size HfS2 nanoforest has been directly grown on diverse objective substrates covering insulating, semiconducting and conducting substrates. This direct CVD growth without conventional transfer process avoids contamination and degradation in quality, suggesting its promising and wide applications in high-quality and multifarious devices. It is noted that all the HfS2 nanoforests grown on diverse substrates are constructed with vertically aligned few-layered HfS2 nanosheets with high crystalline quality and edge orientation. Moreover, due to its unique structure, the HfS2 nanoforest owns abundant exposed edge sites and large active surface area, which is essential to apply in high-performance catalyst, sensor, and energy storage or field emitter. (C) 2017 Elsevier B.V. All rights reserved.

Original languageEnglish
JournalApplied Surface Science
Volume435
Pages (from-to)563-567
Number of pages5
ISSN0169-4332
DOIs
Publication statusPublished - 30 Mar 2018

    Research areas

  • Chemical vapor deposition, Hafnium disulfide, Two-dimensional, Transition metal dichalcogenides, Diverse substrates, TRANSITION-METAL DICHALCOGENIDES, VAPOR-DEPOSITION, LAYER, NANOSHEETS, ELECTROCATALYSIS, PHOTODETECTORS, SEMICONDUCTORS, CRYSTALLINE, ELECTRONICS, GRAPHENE

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