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Controllable etching of MoS2 basal planes for enhanced hydrogen evolution through the formation of active edge sites
Zegao Wang, Qiang Li, Haoxiang Xu, Christian Dahl-Petersen, Qian Yang, Daojian Cheng, Dapeng Cao, Flemming Besenbacher, Jeppe V. Lauritsen, Stig Helveg, Mingdong Dong*
*Corresponding author for this work
Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaper › Journal article › Research › peer-review