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Van der Waals heterojunctions based on atomically thin 2D materials have opened up new realms in modern semiconductor industry. However, it is still challenging to fabricate large-area ultrathin 2D films. Herein, we successfully fabricate wafer-size 2D SnSe films on Si substrate by magnetron sputtering technique, enabling the formation of SnSe/Si van der Waals (vdWs) heterojunction device. The high-resolution transmission electron microscopy is employed to character the structure of SnSe film and SnSe/Si heterojunction with ideal orthorhombic structure and atomically abrupt interface, respectively. The energy diagram of SnSe/Si heterojunction is constructed, exhibiting similar barrier heights for electron and hole carrier. The SnSe/Si heterojunction shows obvious diode behavior with rectification ratio of ∼1.6 ×10 4 , forward current of ∼194.5 mA cm -2 at ±1.0 V. Furthermore, owing to the high crystalline orientation, specific energy-band alignment, as well as the strong built-in electrical field, the SnSe/Si heterojunction illustrates a broadband photodetecting properties with the wavelength ranging from ultraviolet to near-infrared light, showing a high detectivity of 4.4 ×10 12 cmHz 1/2 W -1 , a high responsivity of 566.4 mA mW -1 and an ultrafast response/recovery time of ∼1.6/47.7 s under zero external bias. This work provides a new strategy for fabrication of low cost 2D optoelectronic devices with high-performance.
Original language | English |
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Article number | 034004 |
Journal | 2D materials |
Volume | 6 |
Issue | 3 |
ISSN | 2053-1583 |
DOIs | |
Publication status | Published - May 2019 |
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