Aarhus University Seal / Aarhus Universitets segl

Profilometry and stress analysis of suspended nanostructured thin films

Publikation: Bidrag til tidsskrift/Konferencebidrag i tidsskrift /Bidrag til avisTidsskriftartikelForskningpeer review

DOI

The profile of suspended silicon nitride thin films patterned with one-dimensional subwavelength grating structures is investigated using atomic force microscopy. We first show that the results of the profilometry can be used as input to rigorous coupled wave analysis simulations to predict the transmission spectrum of the gratings under illumination by monochromatic light at normal incidence and compare the results of the simulations with experiments. Second, we observe sharp vertical deflections of the films at the boundaries of the patterned area due to local modifications of the tensile stress during the patterning process. These deflections are experimentally investigated for various grating structures and discussed on the basis of a simple analytical model and finite element method simulations.

OriginalsprogEngelsk
Artikelnummer065302
TidsskriftJournal of Applied Physics
Vol/bind129
Nummer6
ISSN0021-8979
DOI
StatusUdgivet - feb. 2021

Se relationer på Aarhus Universitet Citationsformater

ID: 200834151