Plasma-enhanced chemical vapor deposition of TiB2 and TiBN hard coatings using BBr3

Farid Movassagh-Alanagh, Amir Abdollah-zadeh*, Maryam Alizadeh Zolbin, Narguess Nemati, Ramin Aghababaei

*Corresponding author af dette arbejde

Publikation: Bidrag til tidsskrift/Konferencebidrag i tidsskrift /Bidrag til avisTidsskriftartikelForskningpeer review

Abstract

In this work, titanium nitride, titanium boro-nitride and titanium di boride coatings were deposited on H13 steel using plasma-enhanced chemical vapor deposition from BBr 3, TiCl 4, N 2, H 2 and Ar reactants at 500 °C. The results showed that the TiBN coating has a crystalline microstructure composed of both TiN and TiB 2 phases. The calculated crystalline size of the TiN, TiBN and TiB 2 coatings was about 13, 10 and 32 nm, respectively. The thickness of TiN, TiBN and TiB 2 coatings was about 2.5, 0.3 and 0.5 µm, respectively. The hardness of TiN, TiBN and TiB 2 films was 15.74, 19.44 and 23.47 GPa, respectively. The highest wear resistance was achieved for the TiB 2 coating thanks to its high hardness and good adhesion strength.

OriginalsprogEngelsk
Artikelnummer108137
TidsskriftTribology International
Vol/bind179
Antal sider16
ISSN0301-679X
DOI
StatusUdgivet - jan. 2023

Fingeraftryk

Dyk ned i forskningsemnerne om 'Plasma-enhanced chemical vapor deposition of TiB2 and TiBN hard coatings using BBr3'. Sammen danner de et unikt fingeraftryk.

Citationsformater