On the Effect of Adhesive Strength and Scratching Depth on Material Transfer During Nanoscale Scratching

Li Ma; Ramin Aghababaei

doi:10.1007/s11249-021-01558-z

On the Effect of Adhesive Strength and Scratching Depth on Material Transfer During Nanoscale Scratching

^*Corresponding author af dette arbejde

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12 Citationer (Scopus)

Abstract

Material transfer during scratching is a direct result of adhesion and abrasive processes. In this work, molecular dynamics simulations are performed to quantify the individual effect of adhesive strength and abrasion depth on material transfer during nanoscratching of Tungsten. It is found that while the influence of adhesion and abrasion is tightly coupled at small scratching depths, the coupling decreases by increasing the scratching depth. Furthermore, it is shown that there exists a critical adhesive strength as a function of scratching depth at which the material removal mechanism transitions from the atom-by-atom to the wear fragment removal. This study confirms that the contribution of the atom-by-atom removal mechanism is suppressed when ploughing dominates the process of material removal.

Originalsprog	Engelsk
Artikelnummer	26
Tidsskrift	Tribology Letters
Vol/bind	70
Nummer	1
ISSN	1023-8883
DOI	https://doi.org/10.1007/s11249-021-01558-z
Status	Udgivet - mar. 2022

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10.1007/s11249-021-01558-z

Citationsformater

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title = "On the Effect of Adhesive Strength and Scratching Depth on Material Transfer During Nanoscale Scratching",

abstract = "Material transfer during scratching is a direct result of adhesion and abrasive processes. In this work, molecular dynamics simulations are performed to quantify the individual effect of adhesive strength and abrasion depth on material transfer during nanoscratching of Tungsten. It is found that while the influence of adhesion and abrasion is tightly coupled at small scratching depths, the coupling decreases by increasing the scratching depth. Furthermore, it is shown that there exists a critical adhesive strength as a function of scratching depth at which the material removal mechanism transitions from the atom-by-atom to the wear fragment removal. This study confirms that the contribution of the atom-by-atom removal mechanism is suppressed when ploughing dominates the process of material removal.",

keywords = "Abrasive wear, Adhesive wear, Nanoscratching, Single asperity wear, Surface damage",

author = "Li Ma and Ramin Aghababaei",

note = "Publisher Copyright: {\textcopyright} 2022, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.",

year = "2022",

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doi = "10.1007/s11249-021-01558-z",

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T1 - On the Effect of Adhesive Strength and Scratching Depth on Material Transfer During Nanoscale Scratching

AU - Ma, Li

AU - Aghababaei, Ramin

PY - 2022/3

Y1 - 2022/3

N2 - Material transfer during scratching is a direct result of adhesion and abrasive processes. In this work, molecular dynamics simulations are performed to quantify the individual effect of adhesive strength and abrasion depth on material transfer during nanoscratching of Tungsten. It is found that while the influence of adhesion and abrasion is tightly coupled at small scratching depths, the coupling decreases by increasing the scratching depth. Furthermore, it is shown that there exists a critical adhesive strength as a function of scratching depth at which the material removal mechanism transitions from the atom-by-atom to the wear fragment removal. This study confirms that the contribution of the atom-by-atom removal mechanism is suppressed when ploughing dominates the process of material removal.

AB - Material transfer during scratching is a direct result of adhesion and abrasive processes. In this work, molecular dynamics simulations are performed to quantify the individual effect of adhesive strength and abrasion depth on material transfer during nanoscratching of Tungsten. It is found that while the influence of adhesion and abrasion is tightly coupled at small scratching depths, the coupling decreases by increasing the scratching depth. Furthermore, it is shown that there exists a critical adhesive strength as a function of scratching depth at which the material removal mechanism transitions from the atom-by-atom to the wear fragment removal. This study confirms that the contribution of the atom-by-atom removal mechanism is suppressed when ploughing dominates the process of material removal.

KW - Abrasive wear

KW - Adhesive wear

KW - Nanoscratching

KW - Single asperity wear

KW - Surface damage

U2 - 10.1007/s11249-021-01558-z

DO - 10.1007/s11249-021-01558-z

M3 - Journal article

AN - SCOPUS:85124718033

SN - 1023-8883

VL - 70

JO - Tribology Letters

JF - Tribology Letters

IS - 1

M1 - 26

ER -

On the Effect of Adhesive Strength and Scratching Depth on Material Transfer During Nanoscale Scratching

Abstract

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