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The in situ thermal migration of alloying agents in an Al-Mg-Si-Li alloy is studied using surface sensitive photo-electron and electron diffraction/imaging techniques. Starting with the preparation of an almost oxide free surface (oxide thickness = 0.1 nm), the relative abundance of alloying agents (Mg, Li and Si) at the surface are recorded at various stages of thermal annealing, from room temperature to melting (which is observed at 550 degrees C). Prior to annealing, the surface abundances are below the detection limit
Originalsprog | Engelsk |
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Artikelnummer | 116501 |
Tidsskrift | Materials Research Express |
Vol/bind | 3 |
Nummer | 11 |
Antal sider | 8 |
ISSN | 2053-1591 |
DOI | |
Status | Udgivet - nov. 2016 |
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