Dose regularization via filtering and projection: An open-source code for optimization-based proximity-effect-correction for nanoscale lithography

Research output: Contribution to journal/Conference contribution in journal/Contribution to newspaperJournal articleResearchpeer-review

Original languageEnglish
JournalMicroelectronic Engineering
Volume199
Pages (from-to)52-57
Number of pages6
ISSN0167-9317
DOIs
Publication statusPublished - 5 Nov 2018

    Research areas

  • Lithography, Optimization, Proximity effect correction

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